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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/364TTDS
Repositóriosid.inpe.br/mtc-m18@80/2009/09.22.13.07
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.22.13.07.53
Última Atualização dos Metadados2020:04.28.17.49.06 (UTC) administrator
Chave SecundáriaINPE--PRE/
Chave de CitaçãoCorreaUeMaMiBaFe:2009:ImElRe
TítuloImprovement of Electrochemical Response of Diamond Film with Sulfur Addition by Nitrogen Plasma Immersion Ion Implantation
Ano2009
Data de Acesso21 maio 2024
Tipo SecundárioPRE CI
2. Contextualização
Autor1 Correa, W. L. A.
2 Ueda, Mário
3 Matsushima, J. T.
4 Miranda, C. R. B.
5 Baldan, Maurício Ribeiro
6 Ferreira, Neidenei Gomes
Grupo1
2 LAP-CTE-INPE-MCT-BR
3 LAP-CTE-INPE-MCT-BR
4 LAP-CTE-INPE-MCT-BR
5 LAP-CTE-INPE-MCT-BR
6 LAP-CTE-INPE-MCT-BR
Afiliação1 Universidade São Francisco
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
6 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoInternational Workshop on Plasma-Based Ion Implantation and Deposition, 10 (PPI&D).
Localização do EventoSão José dos Campos, SP
Data7-11 Sept.
Tipo TerciárioPoster
Histórico (UTC)2009-09-22 13:07:53 :: simone -> administrator ::
2020-04-28 17:49:06 :: administrator -> simone :: 2009
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
ResumoThe purpose of this work was to investigate the effects of nitrogen plasma immersion ion implantation on diamond film with sulfur addition. The diamond film was grown on Si substrate by hot filament chemical vapor deposition (HFCVD). It was examined how added sulfur influences the diamond growth rate, morphology, growth orientation and the crystal quality as well as the improvement of electrochemical response by nitrogen plasma ion implantation. The morphology and structure of the film were studied by scanning electron microscopy (SEM) and visible Raman spectroscopy techniques, respectively. Plasma immersion ion implantation technique showed good nitrogen implanted profile. For nitrogen implantation, a DC glow discharge plasma of 1x1010 cm-3 density were produced in a 1 mTorr nitrogen gas pressures and a high voltage pulses of 12 kV amplitude, 50 ìs duration and 300 Hz repetition frequency. The characterization of the working potential window and capacitive currents were obtained by cyclic voltammetry measurements. The results showed that electrochemical response of the diamond films were improved by nitrogen plasma ion implantation, however the film morphology is crucial to analyze the results from cyclic voltammograms.
ÁreaFISPLASMA
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Conteúdo da Pasta docnão têm arquivos
Conteúdo da Pasta sourcenão têm arquivos
Conteúdo da Pasta agreementnão têm arquivos
4. Condições de acesso e uso
Grupo de Usuáriossimone
administrator
Visibilidadeshown
Permissão de Leituraallow from all
5. Fontes relacionadas
Repositório Espelhosid.inpe.br/mtc-m18@80/2008/03.17.15.17.24
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn keywords label language lineage mark nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
7. Controle da descrição
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